H(2)O(2) and/or TiO(2) photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes. - Related Documents




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782401.0000H(2)O(2) and/or TiO(2) photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes. Inactivating antibiotic resistant bacteria (ARB) and removing antibiotic resistance genes (ARGs) are very important to prevent their spread into the environment. Previous efforts have been taken to eliminate ARB and ARGs from aqueous solution and sludges, however, few satisfying results have been obtained. This study investigated whether photocatalysis by TiO(2) was able to reduce the two ARGs, mecA and ampC, within the host ARB, methicillin-resistant Staphylococcus aureus (MRSA) and Pseudomonas aeruginosa, respectively. The addition of H(2)O(2) and matrix effect on the removal of ARB and ARGs were also studied. TiO(2) thin films showed great effect on both ARB inactivation and ARGs removal. Approximately 4.5-5.0 and 5.5-5.8 log ARB reductions were achieved by TiO(2) under 6 and 12mJ/cm(2) UV(254) fluence dose, respectively. For ARGs, 5.8 log mecA reduction and 4.7 log ampC reduction were achieved under 120mJ/cm(2) UV(254) fluence dose in the presence of TiO(2). Increasing dosage of H(2)O(2) enhanced the removal efficiencies of ARB and ARGs. The results also demonstrated that photocatalysis by TiO(2) was capable of removing both intracellular and extracellular forms of ARGs. This study provided a potential alternative method for the removal of ARB and ARGs from aqueous solution.201727776873
782510.9999Comparison of different disinfection processes in the effective removal of antibiotic-resistant bacteria and genes. This study compared three different disinfection processes (chlorination, E-beam, and ozone) and the efficacy of three oxidants (H2O2, S2O(-)8, and peroxymonosulfate (MPS)) in removing antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs) in a synthetic wastewater. More than 30 mg/L of chlorine was needed to remove over 90% of ARB and ARG. For the E-beam method, only 1 dose (kGy) was needed to remove ARB and ARG, and ozone could reduce ARB and ARG by more than 90% even at 3 mg/L ozone concentration. In the ozone process, CT values (concentration × time) were compared for ozone alone and combined with different catalysts based on the 2-log removal of ARB and ARG. Ozone treatment yielded a value of 31 and 33 (mg·min)/L for ARB and ARGs respectively. On the other hand, ozone with persulfate yielded 15.9 and 18.5 (mg·min)/L while ozone with monopersulfate yielded a value of 12 and 14.5 (mg·min)/L. This implies that the addition of these catalysts significantly reduces the contact time to achieve a 2-log removal, thus enhancing the process in terms of its kinetics.201425079831
784720.9998Inactivation and change of tetracycline-resistant Escherichia coli in secondary effluent by visible light-driven photocatalytic process using Ag/AgBr/g-C(3)N(4). Control of antibiotic-resistant bacteria (ARB) and their related genes in secondary effluents has become a serious issue because of increased awareness of their health risks. A considerable number of techniques have been developed in recent years, particularly in relation to advanced oxidation. However, limited information is known about cellular behavior and resistance characteristic change during photocatalytic treatment. In this study, the inactivation of tetracycline (TC)-resistant Escherichia coli (TC-E. coli), removal of TC-resistant genes (TC-RGs), and antibiotic susceptibility were evaluated by employing photocatalytic treatment using Ag/AgBr/g-C(3)N(4) with visible light irradiation. The effects of light intensity, photocatalyst dosage, and reaction ambient temperature on photocatalysis were modelled and investigated. The rate of TC-E. coli removal was also optimized. Results demonstrated that the optimal conditions for TC-E. coli removal included light intensity of 96.0 mW/cm(2), photocatalyst dosage of 211.0 mg/L, and reaction ambient temperature of 23.7 °C. Under such conditions, the ARB removal rate was 6.1 log after 90 min and the related TC-RG removal rates were 49%, 86%, 69%, and 86% for tetA, tetM, tetQ, and intl1, respectively. The minimum inhibitory concentration test after photocatalysis shows that the antibiotic resistance of TC-E. coli was enhanced, which may be mainly due to the changes in the membrane potential and resulted in difficulty in destroying the bacteria through antibiotic contact. Hence, photocatalytic treatment could be an ideal method for ARB and antibiotic-resistant gene (ARG) control in wastewater, but the health risks of the remaining ARB and ARG should be investigated further.202031841919
786630.9998Inactivation of sulfonamide antibiotic resistant bacteria and control of intracellular antibiotic resistance transmission risk by sulfide-modified nanoscale zero-valent iron. The inactivation of a gram-negative sulfonamide antibiotic resistant bacteria (ARB) HLS.6 and removal of intracellular antibiotic resistance gene (ARG, sul1) and class I integrase gene (intI1) by nanoscale zero-valent iron (nZVI) and sulfide-modified nZVI (S-nZVI) with different S/Fe molar ratios were investigated in this study. The S-nZVI with high sulfur content (S/Fe = 0.05, 0.1, 0.2) was superior to nZVI and the treatment effect was best when S/Fe was 0.1. The ARB (2 × 10(7) CFU/mL) could be completely inactivated by 1.12 g/L of S-nZVI (S/Fe = 0.1) within 15 min, and the removal rates of intracellular sul1 and intI1 reached up to 4.39 log and 4.67 log at 60 min, respectively. Quenching experiments and flow cytometry proved that reactive oxygen species and adsorption were involved in the ARB inactivation and target genes removal. Bacterial death and live staining experiments and transmission electron microscopy showed that the ARB cell structure and intracellular DNA were severely damaged after S-nZVI treatment. This study provided a potential alternative method for controlling the antibiotic resistance in aquatic environment.202032585519
784640.9998Removal of antibiotic resistance genes and inactivation of antibiotic-resistant bacteria by oxidative treatments. The persistence of antibiotics in the environment because of human activities, such as seafood cultivation, has attracted great attention as they can give rise to antibiotic resistance genes (ARGs) and antibiotic-resistant bacteria (ARB). In this study, we explored the inactivation and removal efficiencies of Escherichia coli SR1 and sul1 (plasmid-encoded ARGs), respectively, in their extracellular and intracellular forms (eARGs and iARGs) by three commonly used fishery oxidants, namely chlorine, bromine, and potassium permanganate (KMnO(4)), at the practical effective concentration range (0.5, 5, and 15 mg/L). Kinetics data were obtained using laboratory phosphate-buffered saline (PBS). Following the same fishery oxidation methods, the determined kinetics models were tested by studying the SR1 and sul1 disinfection efficiencies in (sterilized) pond water matrix. At concentrations of 5 and 15 mg/L, all three oxidants achieved sufficient cumulative integrated exposure (CT values) to completely inactivate SR1 and efficiently remove sul1 (up to 4.0-log). The oxidation methods were then applied to an unsterilized pond water matrix in order to study and evaluate the indigenous ARB and ARGs disinfection efficiencies in aquaculture, which reached 1.4-log and 1.0-log during treatment with fishery oxidants used in pond preparation at high concentrations before stocking (5-15 mg/L), respectively. A high chlorine concentration (15 mg/L) could efficiently remove ARGs (or iARGs) from pond water, and the iARG removal efficiency was higher than that of eARGs in pond water. The method and results of this study could aid in guiding future research and practical disinfection to control the spread of ARGs and ARB in aquaculture.202134030387
778850.9998Inactivation of antibiotic resistant Escherichia coli and degradation of its resistance genes by glow discharge plasma in an aqueous solution. Emerging contaminants such as antibiotic resistance bacteria (ARB) and antibiotic resistance genes (ARGs) are becoming a global environmental problem. In this study, the glow discharge plasma (GDP) was applied for degrading antibiotic resistant Escherichia coli (E. coli) with resistance genes (tetA, tetR, aphA) and transposase gene (tnpA) in 0.9% sterile saline. The results showed that GDP was able to inactivate the antibiotic resistant E. coli and remove the ARGs and reduce the risk of gene transfer. The levels of E. coli determined by 16S rRNA decreased by approximately 4.7 logs with 15 min of discharge treatment. Propidium monoazide - quantitative polymerase chain reaction (PMA-qPCR) tests demonstrated that the cellular structure of 4.8 more logs E. coli was destroyed in 15 min. The reduction of tetA, tetR, aphA, tnpA genes was increased to 5.8, 5.4, 5.3 and 5.5 logs with 30 min discharge treatment, respectively. The removal of ARGs from high salinity wastewater was also investigated. The total abundance of ARGs was reduced by 3.9 logs in 30 min. Scavenging tests indicated that hydroxyl radicals (·OH) was the most probable agents for bacteria inactivation and ARGs degradation. In addition, the active chlorine (Cl· and Cl(2)) which formed during the discharge may also contribute to the inactivation and degradation.202032229364
782660.9998Synergistic effect of sulfidated nano zerovalent iron and persulfate on inactivating antibiotic resistant bacteria and antibiotic resistance genes. Antimicrobial resistance continues to be a rising global threat to public health. It is well recognized that wastewater treatment plants are reservoirs of antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs). However, traditional disinfection techniques are not effective to simultaneously remove ARB and ARGs, and the dynamic analysis of ARB inactivation have also been deficient. In this study, sulfidated nano zerovalent iron (S-nZVI) coupled with persulfate (PS) was applied to simultaneously remove both ARB (E. coli K-12 with RP4 plasmid) and ARGs (extra- and intracellular ARGs). S-nZVI/PS completely inactivated ARB (~7.8-log reduction) within 10 min and degraded all extracellular ARGs (~8.0-log reduction) within 5 min. These efficiencies were significantly higher (decay rate constant, k = 0.138 min(-1)) than those achieved individually (S-nZVI: k = 0.076 min(-1); PS: k = 0.008 min(-1)), implying a synergistic effect between S-nZVI and PS against ARB and ARGs. The efficient removal rate of ARB was also supported by confocal microscopy and microfluidics at a single-cell level. The complete inactivation of ARB by S-nZVI/PS was also demonstrated in real drinking water and real wastewater effluent that contained natural organic matter and suspended solids. Regrowth assays showed that the treated ARB was not observed after 72 h or longer incubation, suggesting that ARB was permanently inactivated by radicals such as SO(4)(•-) and •OH. The destruction of bacterial cells compromised the removal efficiency of the intracellular ARGs, with only ~4.0-log reduction after 60 min treatment by S-nZVI/PS. Collectively, our results suggest the feasibility of S-nZVI coupled with PS for simultaneous ARB and ARGs removal in real water matrices.202133895590
780770.9998Copper oxide/peroxydisulfate system for urban wastewater disinfection: Performances, reactive species, and antibiotic resistance genes removal. In this study, copper oxide (CuO) catalyzed peroxydisulfate (PDS) system was investigated for the inactivation of a broad range of pathogenic microorganisms from urban wastewater. Complete inactivation of Escherichia coli, Enterococcus, F-specific RNA bacteriophages from secondary treated wastewater was achieved after a short time (15-30 min) treatment with CuO (10 g/L)/PDS (1 mM) system, but spores of sulfite-reducing bacteria took 120 min. No bacterial regrowth occurred during storage after treatment. Significant reduction of the pathogens was explained by the generation of the highly selective Cu(III) oxidant, as the predominant reactive species, which could quickly oxidize guanine through a one-electron oxidation pathway. Additionally, the potential of the CuO (10 g/L)/PDS (1 mM) system to inactivate antibiotic-resistant bacteria and antibiotic resistance genes (ARB&Gs) was explored. Sulfamethoxazole-resistant E. coli was used as the model ARB and a 3.2 log of reduction was observed after 10 min of treatment. A considerable reduction (0.7-2.3 log) of selected ARGs including blaTEM, qnrS, emrB, sul1, and genes related to the dissemination of antibiotic resistance, including the Class 1 integron-integrase (intI1), and the insertion sequence (IS613) was achieved after 60 min treatment. All these findings indicated the promising applicability of the CuO/PDS system as a disinfection technology for wastewater reuse in agriculture.202234648831
782780.9998Inactivation of antibiotic-resistant bacteria and antibiotic resistance genes by electrochemical oxidation/electro-Fenton process. Antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs) in the environment are of great concern due to their potential risk to human health. The effluents from wastewater treatment plants and livestock production are major sources of ARB and ARGs. Chlorination, UV irradiation, and ozone disinfection cannot remove ARGs completely. In this study, the potential of electrochemical oxidation and electro-Fenton processes as alternative treatment technologies for inactivation of ARB and ARGs in both intracellular and extracellular forms was evaluated. Results showed that the electrochemical oxidation process was effective for the inactivation of selected ARB but not for the removal of intracellular ARGs or extracellular ARGs. The electro-Fenton process was more effective for the removal of both intracellular and extracellular ARGs. The removal efficiency after 120 min of electro-Fenton treatment under 21.42 mA/cm(2) was 3.8 logs for intracellular tetA, 4.1 logs for intracellular ampC, 5.2 logs for extracellular tetA, and 4.8 logs for extracellular ampC, respectively in the presence of 1.0 mmol/L Fe(2+). It is suggested that electrochemical oxidation is an effective disinfection method for ARB and the electro-Fenton process is a promising technology for the removal of both intracellular and extracellular ARGs in wastewater.202032701499
800590.9997Deciphering the fate of antibiotic resistance genes in norfloxacin wastewater treated by a bio-electro-Fenton system. The misuse of antibiotics has increased the prevalence of antibiotic resistance genes (ARGs), considered a class of critical environmental contaminants due to their ubiquitous and persistent nature. Previous studies reported the potentiality of bio-electro-Fenton processes for antibiotic removal and ARGs control. However, the production and fate of ARGs in bio-electro-Fenton processes triggered by microbial fuel cells are rare. In this study, the norfloxacin (NFLX) average residual concentrations within two days were 2.02, 6.07 and 14.84 mg/L, and the average removal efficiency of NFLX was 79.8 %, 69.6 % and 62.9 % at the initial antibiotic concentrations of 10, 20 and 40 mg/L, respectively. The most prevalent resistance gene type in all processes was the fluoroquinolone antibiotic gene. Furthermore, Proteobacteria was the dominant ARG-carrying bacteria. Overall, this study can provide theoretical support for the efficient treatment of high antibiotics-contained wastewater by bio-electro-Fenton systems to better control ARGs from the perspective of ecological security.202236252757
7572100.9997Stormwater runoff treatment through electrocoagulation: antibiotic resistant bacteria removal and its transmission risks. Recently, increasing attention has been paid to antibiotic resistant bacteria (ARB) in stormwater runoff. However, there were little data on ARB removal through electrocoagulation (EC) treatment. In this study, batch experiments were conducted to investigate key designs for ARB removal, role of SS, effects of water matrix, and potential risks after EC treatment under the pre-determined conditions. EC treatment with 5 mA/cm(2) of current density and 4 cm of inter-electrode distance was optimal with the highest ARB removal (3.04 log reduction for 30 min). The presence of SS significantly improved ARB removal during EC treatment, where ARB removal increased with the increase of SS levels when SS less than 300 mg/L. Large ARB removal was found under particles with size lower than 150 μm with low contribution (less than 10%) of the settlement without EC treatment, implying that the enhancement of ARB adsorption onto small particles could be one of the reasonable approaches for ARB removal through EC treatment. ARB removal increased firstly and then decreased with the increase of pH, while had proportional relationship with conductivity. After the optimal condition, there were weak conjugation transfer but high transformation frequency (5.5 × 10(-2) for bla(TEM)) for target antibiotic resistance genes (ARGs), indicating that there could be still a risk of antibiotic resistance transformation after EC treatment. These suggested that the combination of EC and other technologies (like electrochemical disinfection) should be potential ways to control antibiotic resistance transmission through stormwater runoff.202436848218
7820110.9997Metagenomic analysis of MWWTP effluent treated via solar photo-Fenton at neutral pH: Effects upon microbial community, priority pathogens, and antibiotic resistance genes. The effectiveness of advanced technologies on eliminating antibiotic resistant bacteria (ARB) and resistance genes (ARGs) from wastewaters have been recently investigated. Solar photo-Fenton has been proven effective in combating ARB and ARGs from Municipal Wastewater Treatment Plant effluent (MWWTPE). However, most of these studies have relied solely on cultivable methods to assess ARB removal. This is the first study to investigate the effect of solar photo-Fenton upon ARB and ARGs in MWWTPE by high throughput metagenomic analysis (16S rDNA sequencing and Whole Genome Sequencing). Treatment efficiency upon priority pathogens and resistome profile were also investigated. Solar photo-Fenton (30 mg L(-1) of Fe(2+) intermittent additions and 50 mg L(-1) of H(2)O(2)) reached 76-86% removal of main phyla present in MWWTPE. An increase in Proteobacteria abundance was observed after solar photo-Fenton and controls in which H(2)O(2) was present as an oxidant (Fenton, H(2)O(2) only, solar/H(2)O(2)). Hence, tolerance mechanisms presented by this group should be further assessed. Solar photo-Fenton achieved complete removal of high priority Staphylococcus and Enterococcus, as well as Klebsiella pneumoniae and Pseudomonas aeruginosa. Substantial reduction of intrinsically multi-drug resistant bacteria was detected. Solar photo-Fenton removed nearly 60% of ARGs associated with sulfonamides, macrolides, and tetracyclines, and complete removal of ARGs related to β-lactams and fluoroquinolones. These results indicate the potential of using solar-enhanced photo-Fenton to limit the spread of antimicrobial resistance, especially in developing tropical countries.202134467925
7867120.9997The removal of antibiotic resistant bacteria and antibiotic resistance genes by sulfidated nanoscale zero-valent iron activating periodate: Efficacy and mechanism. Antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs) have drawn much more attention due to their high risk on human health and ecosystem. In this study, the performance of sulfidated nanoscale zero-valent iron (S-nZVI)/periodate (PI) system toward ARB inactivation and ARGs removal was systematically investigated. The S-nZVI/PI system could realize the complete inactivation of 1 × 10(8) CFU/mL kanamycin, ampicillin, and tetracycline-resistant E. coli HB101 within 40 min, meanwhile, possessed the ability to remove the intracellular ARGs (iARGs) (including aphA, tetA, and tnpA) carried by E. coli HB101. Specifically, the removal of aphA, tetA, and tnpA by S-nZVI/PI system after 40 min reaction was 0.31, 0.47, and 0.39 log(10)copies/mL, respectively. The reactive species attributed to the E. coli HB101 inactivation were HO(•) and O(2)(•-), which could cause the destruction of E. coli HB101 morphology and enzyme system (such as superoxide dismutase and catalase), the loss of intracellular substances, and the damage of iARGs. Moreover, the influence of the dosage of PI and S-nZVI, the initial concentration of E. coli HB101, as well as the co-existing substance (such as HCO(3)(-), NO(3)(-), and humic acid (HA)) on the inactivation of E. coli HB101 and its corresponding iARGs removal was also conducted. It was found that the high dosage of PI and S-nZVI and the low concentration of E. coli HB101 could enhance the disinfection performance of S-nZVI/PI system. The presence of HCO(3)(-), NO(3)(-), and HA in S-nZVI/PI system showed inhibiting role on the inactivation of E. coli HB101 and its corresponding iARGs removal. Overall, this study demonstrates the superiority of S-nZVI/PI system toward ARB inactivation and ARGs removal.202337544470
7795130.9997Factors influencing the removal of antibiotic-resistant bacteria and antibiotic resistance genes by the electrokinetic treatment. The performance of the electrokinetic remediation process on the removal of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs) was evaluated with different influencing factors. With chlortetracycline (CTC), oxytetracycline (OTC), and tetracycline (TC) as template chemicals, the removal of both ARB and ARGs was enhanced with the increase of voltage gradient (0.4-1.2 V cm(-1)) and prolonged reaction time (3-14 d). The greatest removal (26.01-31.48% for ARB, 37.93-83.10% for ARGs) was obtained applying a voltage of 1.2 V cm(-1), leading to the highest electrical consumption. The effect of polarity reversal intervals on the inactivation ratio of ARB followed the order of 0 h (66.06-80.00%) > 12 h (17.07-24.75%) > 24 h (10.44-13.93%). Lower pH, higher current density, and more evenly-distributed voltage drop was observed with a polarity reversal interval of 12 h compared with that of 24 h, leading to more efficient electrochemical reactions in soil. Compared with sul genes, tet genes were more vulnerable to be attacked in an electric field. It was mainly attributed to the lower abundance of tet genes (except tetM) and the varied effects of electrokinetic remediation process on different ARGs. Moreover, a relatively less removal ratio of tetC and tetG was obtained mainly due to the mechanism of the efflux pump upregulation. Both tet and sul genes were positively correlated with TC-resistant bacteria. The efflux pump genes like tetG and the cellular protection genes like tetM showed different correlations with ARB. This study enhances the current understanding on the removal strategies of ARB and ARGs, and it provides important parameters for their destruction by the electrokinetic treatment.201829807293
7794140.9997Fate of antibiotic resistant bacteria and genes during wastewater chlorination: implication for antibiotic resistance control. This study investigated fates of nine antibiotic-resistant bacteria as well as two series of antibiotic resistance genes in wastewater treated by various doses of chlorine (0, 15, 30, 60, 150 and 300 mg Cl2 min/L). The results indicated that chlorination was effective in inactivating antibiotic-resistant bacteria. Most bacteria were inactivated completely at the lowest dose (15 mg Cl2 min/L). By comparison, sulfadiazine- and erythromycin-resistant bacteria exhibited tolerance to low chlorine dose (up to 60 mg Cl2 min/L). However, quantitative real-time PCRs revealed that chlorination decreased limited erythromycin or tetracycline resistance genes, with the removal levels of overall erythromycin and tetracycline resistance genes at 0.42 ± 0.12 log and 0.10 ± 0.02 log, respectively. About 40% of erythromycin-resistance genes and 80% of tetracycline resistance genes could not be removed by chlorination. Chlorination was considered not effective in controlling antimicrobial resistance. More concern needs to be paid to the potential risk of antibiotic resistance genes in the wastewater after chlorination.201525738838
7792150.9997Comparative removal of two antibiotic resistant bacteria and genes by the simultaneous use of chlorine and UV irradiation (UV/chlorine): Influence of free radicals on gene degradation. The research aimed to remove antibiotic resistance by the simultaneous use of UV irradiation and chlorine (UV/chlorine). The inactivations of tetracycline resistant bacteria (TRB) during chlorination, UV irradiation, and UV/chlorine was investigated and compared with those of amoxicillin resistant bacteria (AmRB). Similar examination was also conducted for comparing the removals of their resistant genes (i.e., tetM and blaTem). The removals of antibiotic resistance highly depended on chlorine doses and UV intensities. The sufficient chlorine dose (20 mg.L(-1)) in the chlorination and the UV/chlorine completely inactivated TRB and AmRB (>7.3 log), while the UV irradiation could not achieve the complete disinfection. Microorganisms resistant to different antibiotics exhibit different susceptibility to the disinfection processes. The removals of antibiotic resistant genes (i.e., tetM and blaTem) were more difficult than those of TRB and AmRB. The UV/chlorine was the greatest process for tetM and blaTem removals, followed by chlorination and UV irradiation, respectively. Chlorination decreased the tetM and blaTem by 0.40-1.45 log and 1.04-2.45 log, respectively. The blaTem gene was highly reactive to chlorine, compared with tetM. The UV irradiation caused the tetM and blaTem reductions by 0.32-0.91 log and 0.59-0.96 log, respectively. The UV/chlorine improved the tetM and blaTem removals by 0.98-3.20 log and 1.28-3.36 log, respectively. The •OH contributed to the fraction of tetM and blaTem removals by 48% and 19%, respectively. The effect of reactive chlorine species on the tetM and blaTem removals was minor. The pseudo 1st-order kinetic constants (k') for tetM and blaTem removals by the UV/chlorine were highest. The •OH enhanced the k' values by 120% and 20% for the tetM and blaTem removals, respectively. The study showed the potential use of UV/chlorine for controlling antibiotic resistance.202133059146
7844160.9997Insight into using a novel ultraviolet/peracetic acid combination disinfection process to simultaneously remove antibiotics and antibiotic resistance genes in wastewater: Mechanism and comparison with conventional processes. In this study, the simultaneous removal mechanism of antibiotics and antibiotic resistance genes (ARGs) was investigated using the novel ultraviolet/peracetic acid (UV/PAA) combination disinfection process and conventional disinfection processes were also applied for comparison. The results showed that UV/PAA disinfection with a high UV dosage (UV/PAA-H) was most effective for the removal of tetracyclines, quinolones, macrolides and β-lactams; their average removal efficiencies ranged from 25.7% to 100%, while NaClO disinfection was effective for the removal of sulfonamides (∼81.6%). The majority of ARGs were well removed after the UV/PAA-H disinfection, while specific genes including tetB, tetC, ermA and bla(TEM) significantly increased after NaClO disinfection. In addition, β-lactam resistance genes (-35.9%) and macrolides resistance genes (-12.0%) remarkably augmented after UV/NaClO disinfection. The highly reactive oxidation species generated from UV/PAA process including hydroxyl radicals (•OH) and carbon-centered organic radicals (R-C•), were responsible for the elimination of antibiotics and ARGs. Correlation analysis showed that tetracycline, sulfonamide and macrolide antibiotics removal showed a positive correlation with the corresponding ARGs, and a low dose of antibiotic residues played an important role in the distribution of ARGs. Metagenomic sequencing analysis showed that UV/PAA disinfection could not only greatly decrease the abundance of resistant bacteria but also downregulate the expression of key functional genes involved in ARGs propagation and inhibit the signal transduction of the host bacteria, underlying that its removal mechanism was quite different from that of NaClO-based disinfection processes. Our study provides valuable information for understanding the simultaneous removal mechanism of antibiotics and ARGs in wastewater during the disinfection processes, especially for the novel UV/PAA combination process.202234982977
7791170.9997Investigation of reduction in risk from antibiotic resistance genes in laboratory wastewater by using O(3) , ultrasound, and autoclaving. Biological laboratory wastewater containing both antibiotic-resistant bacteria (ARB) and antibiotics is a potential source of antibiotic resistance genes (ARGs). Thus, we determined the efficacy of autoclaving, a common disinfection method, in eliminating 5 ARGs (sul1, sul2, tetW, tetM, amp) and the integrase-encoding gene intI1 from laboratory wastewater. Autoclaving (15 min, 121°C) inactivated all bacteria including ARB, whereas ARGs persisted in the wastewater with limited reduction even after 60 min of treatment. Ozonation (O(3) ), ultrasound (US), O(3) /US, and autoclaving followed by O(3) were investigated for their ability to reduce ARGs in laboratory wastewater. With O(3) and O(3) /US, the reduction rate ranged from 5.44 to 7.13 log for all ARGs investigated. Wastewater treatment with US alone did not reduce ARGs under the present experimental conditions (150 W, 53 kHz). Among the four treatments, autoclaving followed by O(3) treatment showed the highest reduction rates in the shortest time; however, further optimization and investigation are needed for the advanced treatment of bio-laboratory wastewater. Overall, this study provides novel insights into ARG sources and demonstrates that advanced oxidation methods can be useful to optimize laboratory wastewater treatment for ARG inactivation. PRACTITIONER POINTS: Bio-laboratory wastewater is potential reservoir of ARGs. Conventional autoclaving was not able to reduce ARGs to a low level. Autoclaving-O(3) completely eliminate all the bacteria. Autoclaving-O(3) reduced ARGs efficiently (6.12-7.86 logs removal in 60 min).202132891064
7821180.9997Efficient inactivation of antibiotic resistant bacteria and antibiotic resistance genes by photo-Fenton process under visible LED light and neutral pH. Antibiotic resistance has been recognized as a major threat to public health worldwide. Inactivation of antibiotic resistant bacteria (ARB) and degradation of antibiotic resistance genes (ARGs) are critical to prevent the spread of antibiotic resistance in the environment. Conventional disinfection processes are effective to inactivate water-borne pathogens, yet they are unable to completely eliminate the antibiotic resistance risk. This study explored the potential of the photo-Fenton process to inactivate ARB, and to degrade both extracellular and intracellular ARGs (e-ARGs and i-ARGs, respectively). Using Escherichia coli DH5α with two plasmid-encoded ARGs (tetA and bla(TEM)(-1)) as a model ARB, a 6.17 log ARB removal was achieved within 30 min of applying photo-Fenton under visible LED and neutral pH conditions. In addition, no ARB regrowth occurred after 48-h, demonstrating that this process is very effective to induce permanent disinfection on ARB. The photo-Fenton process was validated under various water matrices, including ultrapure water (UPW), simulated wastewater (SWW) and phosphate buffer (PBS). The higher inactivation efficiency was observed in SWW as compared to other matrices. The photo-Fenton process also caused a 6.75 to 8.56-log reduction in eARGs based on quantitative real-time PCR of both short- and long amplicons. Atomic force microscopy (AFM) further confirmed that the extracellular DNA was sheared into short DNA fragments, thus eliminating the risk of the transmission of antibiotic resistance. As compared with e-ARGs, a higher dosage of Fenton reagent was required to damage i-ARGs. In addition, the tetA gene was more easily degraded than the bla(TEM)(-1) gene. Collectively, our results demonstrate the photo-Fenton process is a promising technology for disinfecting water to prevent the spread of antibiotic resistance.202032417561
7840190.9997Ferrate(VI) promotes inactivation of antibiotic-resistant bacteria and chlorine-resistant bacteria in water. The increasing problem of antibiotic resistance has garnered significant global attention. As a novel water treatment agent with strong oxidizing, disinfecting, and bactericidal properties, ferrate(VI) holds promise for inactivating antibiotic-resistant bacteria (ARB) and chlorine-resistant bacteria. The results showed that complete inactivation of ARB (10⁵ CFU/mL) was achieved when the ferrate(VI) concentration was 10 μM and the treatment duration was 5 min. For higher concentrations of ARB (10(8) CFU/mL), it was also possible to reduce the concentration by 1.73 log units. The concentration of Acinetobacter baylyi ADP1 was also reduced by 1.77 log units. Additionally, the absolute abundance of antibiotic resistance genes (ARGs), including aphA, bla(TEM), and tetA, was significantly reduced. Ferrate(VI) was rapidly consumed in the early stages of treatment, undergoing a stepwise reduction process that generated high-valent Fe intermediates and reactive oxygen species (ROS), both of which contributed to bacterial inactivation. Throughout the reaction, •O(2)(-) played a dominant role in bacterial inactivation, with H₂O₂ acting synergistically and •OH contributing at later stages, leading to ROS overload, severe cellular damage, and enhanced membrane disruption. This study confirmed that ferrate(VI) could effectively inactivate ARB and chlorine-tolerant bacteria, and reduce the abundances of ARGs.202540245720